Varsha 2020 (August - November)
Material & device characterization techniques 
To provide the basics of each technique including instrumentation, samples preparation and the applicability of these techniques.
Develop the concepts on the several materials characterization techniques at the morphological, structural and chemical level.
Demonstrate knowledge about the characterization methods based on microscopy, microanalysis and diffraction techniques, and surface and spectroscopy analysis.
Finally, develop the acquisition skills in the use and selection of advanced experimental techniques for characterization of materials and application of these techniques to solving problems in materials science and engineering.
Microscopy & Optical techniques: Optical Microscopy, Confocal Optical Microscopy, X-ray, Neutron diffraction, TEM, SEM, XPS, EDAX/EDS, Raman, PL, Ellipsometry, AFM & STM.
Electrical properties & characterization techniques: I-V measurement: 2-probe and 4-probe, low noise electronics; C-V measurements, 3 terminal devices and characterization, FET, BJT; Hall effect, Mobility and Carrier concentration; Microwave measurements, ESR, NMR; Defects: DLTS, Channelling; Photoconductivity-Carrier-lifetime, Kelvin-probe.
Magnetic Properties & Characterization: Magneto-transport, MFM, VSM, SQUID.
Text & Reference Books
Semiconductor material and device characterization, D. K Schroder, 2006 John Wiley & Sons.
Materials Characterization: Introduction to Microscopic and Spectroscopic Methods, Second Edition, Yang Leng, Wiley‐VCH 2013