Varsha 2020 (August - November)


Learning Outcomes

Material & device characterization techniques [2013]

  • To provide the basics of each technique including instrumentation, samples preparation and the applicability of these techniques.

  • Develop the concepts on the several materials characterization techniques at the morphological, structural and chemical level.

  • Demonstrate knowledge about the characterization methods based on microscopy, microanalysis and diffraction techniques, and surface and spectroscopy analysis.

  • Finally, develop the acquisition skills in the use and selection of advanced experimental techniques for characterization of materials and application of these techniques to solving problems in materials science and engineering.


  • Microscopy & Optical techniques: Optical Microscopy, Confocal Optical Microscopy, X-ray, Neutron diffraction, TEM, SEM, XPS, EDAX/EDS, Raman, PL, Ellipsometry, AFM & STM.

  • Electrical properties & characterization techniques: I-V measurement: 2-probe and 4-probe, low noise electronics; C-V measurements, 3 terminal devices and characterization, FET, BJT; Hall effect, Mobility and Carrier concentration; Microwave measurements, ESR, NMR; Defects: DLTS, Channelling; Photoconductivity-Carrier-lifetime, Kelvin-probe.

  • Magnetic Properties & Characterization: Magneto-transport, MFM, VSM, SQUID.

Text & Reference Books

  1. Semiconductor material and device characterization, D. K Schroder, 2006 John Wiley & Sons.

  2. Materials Characterization: Introduction to Microscopic and Spectroscopic Methods, Second Edition, Yang Leng, Wiley‐VCH 2013